2

Chlorine/silicon surface reactions under heating

Year:
1991
Language:
english
File:
PDF, 74 KB
english, 1991
8

Si Photo etching in Cl2 gas using a high power Hg lamp

Year:
1987
Language:
english
File:
PDF, 58 KB
english, 1987
9

Chlorine/silicon surface reactions under heating

Year:
1991
Language:
english
File:
PDF, 756 KB
english, 1991
10

Influence of O2 and oxide on Cl/Si surface reactions

Year:
1991
Language:
english
File:
PDF, 906 KB
english, 1991
18

A New Surface Protecting Layer for Si Substrate Preventing Surface Oxidation

Year:
1991
Language:
english
File:
PDF, 700 KB
english, 1991
32

Si photo etching in Cl2 Gas using a high power Hg lamp

Year:
1987
Language:
english
File:
PDF, 815 KB
english, 1987
34

Influence of O2 and oxide on Cl/Si surface reactions

Year:
1991
Language:
english
File:
PDF, 77 KB
english, 1991
35

Annealing and oxidation effects after CF4/H2 dry etching for damage recovery

Year:
1986
Language:
english
File:
PDF, 540 KB
english, 1986